2. Nano-Cluster deposition system
This SinoRaybo NanoSci & Tech co Ltd system produces beams of clusters of metallic atoms and deposits them onto a 15×15 mm substrate with a base pressure <10-8 torr and a deposition rate: 0.01 Å/s – 10 Å/s.
The size of the clusters is highly tunable, it can be as small as a single pair and as big as 105 atoms per cluster (mean diameter 0.5 – 15 nm). The system is also equipped with a mass selector which allows a typical mass resolution tunable in the range of 12 – 100 and typical beam current after selection in the range 5pA – 0.5 nA.
In addition to the one-head 2-inch target (same size than the UHV Sputtering System), the system is also equipped with a two-heads 1.5-inch target magnetron source for the fabrication of clusters alloys.
Personal vinculado: Carlos Garcia, Pablo Ibarra, Alejandro Jara, Claudio Gonzalez, Marian Abellan, Cristian Romanque, Luis Lizardi.
